The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2012
Filed:
Mar. 24, 2011
Applicant:
Tah-te Shih, Taipei, TW;
Inventor:
Tah-Te Shih, Taipei, TW;
Assignee:
Inotera Memories, Inc., Hwa-Ya Technology Park Kueishan, Taoyuan, TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/20 (2012.01);
U.S. Cl.
CPC ...
Abstract
A method for making a mask, in which, an imprinting lithography process is employed to form a pattern in a first region of a mask substrate, and an E-beam writing process is employed to form another pattern in a second region of the mask substrate. Furthermore, these two patterns may be well stitched through an optical alignment process in an E-beam writing chamber.