Suwon, South Korea

Taekjin Kim

This inventor holds 2 USPTO granted patents and 5 published patent applications. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Taekjin Kim. Retrieved from https://idiyas.com/inventor/taekjin-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 6.4

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Taekjin Kim - Innovator in Polishing Control Technology

Introduction

Taekjin Kim is an inventor based in Suwon-si, South Korea. He is known for his innovative contributions to polishing control technology. Although he currently holds no granted patents, his work in developing advanced polishing control devices and methods showcases his expertise in the field.

Latest Patent Applications

Taekjin Kim has submitted several notable patent applications, including:

1. **Polishing Control Device, Polishing Control Method, and Substrate Polishing Method Using the Same** - This application describes a polishing control device that includes a head for mounting a substrate, a platen facing the head, a signal-generating source, a sensor for detecting the signal, and a controller for analyzing the signal and controlling the polishing process.

2. **Dielectric Structure and Substrate Processing Apparatus Including the Same** - This application outlines a dielectric structure featuring an insulating layer, multiple conductor layers, a semiconductor layer, and protective layers covering both the conductor and semiconductor layers.

Conclusion

Taekjin Kim's innovative work in polishing control technology reflects his commitment to advancing the field. His latest patent applications demonstrate his potential to contribute significantly to substrate processing methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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