The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2026
Filed:
May. 31, 2023
Samsung Electronics Co., Ltd., Suwon-si, KR;
Meehyun Lim, Suwon-si, KR;
Sungyeol Kim, Suwon-si, KR;
Taekjin Kim, Suwon-si, KR;
Minsung Kim, Suwon-si, KR;
Hosun Yoo, Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
An apparatus for monitoring a plasma process may include an electro-optical (EO) sensor module and an optical guide, the EO sensor module may be arranged in a plasma chamber configured to perform a semiconductor process for processing a substrate using plasma, the EO sensor module may include a non-conductive material having an optical refractive index changed by an electric field formed in the plasma chamber, the optical guide may form at least one internal path of a light, which may have an optical characteristic changed by the changed optical refractive index, between the EO sensor module and the plasma chamber.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile