Tae Hum Yang

Title: Tae Hum Yang: Innovator in Mask Technology

Introduction

Tae Hum Yang is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of mask technology, particularly in the area of compensating for misalignments in patterns. With a total of 6 patents to his name, Yang continues to push the boundaries of innovation in his field.

Latest Patents

Yang's latest patents include a mask set designed for compensating a misalignment between patterns. This invention discloses a mask set that comprises a first mask made of a substrate on which a main pattern and several sub-patterns are formed. The sub-patterns are positioned alongside the main pattern. Additionally, a second mask is included, which consists of a substrate with multiple hole patterns that correspond to the spaces between the main pattern and the sub-patterns when the first and second masks are overlapped. Furthermore, a third mask is also part of this invention, featuring a substrate with bar patterns that correspond to the hole patterns of the second mask when the second and third masks are aligned.

Career Highlights

Tae Hum Yang is currently employed at Hyundai Electronics Industries Co. Ltd., where he applies his expertise in mask technology. His work has been instrumental in advancing the capabilities of electronic manufacturing processes.

Collaborations

Yang collaborates with notable colleagues, including Joo Young Kim and Young Dong Joo. Their combined efforts contribute to the innovative projects at Hyundai Electronics Industries.

Conclusion

Tae Hum Yang is a key figure in the development of advanced mask technology, with a focus on addressing misalignment issues in patterning. His contributions through patents and collaboration with industry peers highlight his commitment to innovation in electronics.