Susono, Japan

Tadayuki Satou

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Ulvac, Inc.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tadayuki Satou. Retrieved from https://idiyas.com/inventor/tadayuki-satou

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2014

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Tadayuki Satou: Innovator in Electrostatic Technology

Introduction

Tadayuki Satou is a notable inventor based in Susono, Japan. He has made significant contributions to the field of electrostatic technology, particularly through his innovative patent related to electrostatic chucks.

Latest Patents

Tadayuki Satou holds a patent for an electrostatic chuck and vacuum processing apparatus. This invention is designed to securely hold a translucent substrate during processing treatments that involve irradiating light. The electrostatic chuck features a chuck plate made of dielectric material, with two electrodes that create an attractive force to hold the substrate in place. This design ensures that the substrate remains securely held even when the attraction force diminishes due to the photoelectric effect.

Career Highlights

Tadayuki Satou is associated with Ulvac, Inc., a company known for its advancements in vacuum technology and processing equipment. His work has contributed to the development of more efficient and reliable processing methods in various applications.

Collaborations

Some of Tadayuki Satou's coworkers include Tadashi Oka and Kyuzo Nakamura, who collaborate with him in the pursuit of innovative solutions in their field.

Conclusion

Tadayuki Satou's contributions to electrostatic technology exemplify the importance of innovation in advancing processing techniques. His patent reflects a commitment to enhancing the reliability of substrate handling in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…