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Years Active: 2006-2014
Title: The Innovations of Tadashi Serikawa
Introduction
Tadashi Serikawa, an esteemed inventor based in Tokyo, Japan, has made significant contributions to the field of semiconductor technology. With a total of two patents to his name, his work focuses on enhancing the manufacturing processes and characteristics of semiconductor devices.
Latest Patents
One of Serikawa's notable patents is the "Method for manufacturing a semiconductor device using an oxide semiconductor." This invention aims to streamline the manufacturing process of semiconductor devices formed with thin film transistors by reducing the number of photomasks required. The technique enhances productivity and reliability while also lowering manufacturing costs. The key innovation involves forming a channel protective layer over an oxide semiconductor with light-transmitting properties and utilizing a back surface light exposure method.
His second patent, titled "Thin metal oxide film and process for producing the same," outlines a method for creating a crystalline metal oxide thin film. This method involves initially depositing a substantially amorphous metal oxide film and subsequently treating it with low-temperature plasma in a high-frequency electric field. The resulting crystalline metal oxide thin film is densely homogenous and can be formed at low temperatures, preserving the integrity of substrates that may have low heat resistance.
Career Highlights
Tadashi Serikawa has worked with prominent organizations throughout his career, including Toto Ltd. and The University of Tokyo. His experiences at these institutions have played a crucial role in shaping his innovative capacities and technical expertise in semiconductor manufacturing.
Collaborations
Throughout his professional journey, Serikawa has collaborated with notable colleagues such as Koji Fukuhisa and Akira Nakajima. These collaborations have likely contributed to the advancement of his research and the successful development of his inventions.
Conclusion
Tadashi Serikawa remains a prominent figure in the field of semiconductor technology, with his patents reflecting his commitment to innovation and efficiency. His work continues to pave the way for advancements in manufacturing techniques, ensuring a brighter future for the semiconductor industry.