Tokyo, Japan

Tadashi Konuki

This inventor holds 3 USPTO granted patents. Top assignee: Canon Kabushiki Kaisha. Active years: 1985-1988.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tadashi Konuki. Retrieved from https://idiyas.com/inventor/tadashi-konuki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 29(Granted Patents)


Company Filing History:


Years Active: 1985-1988

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Tadashi Konuki: Semiconductor Manufacturing and Mask Alignment

Introduction

Tadashi Konuki is an inventor associated with Tokyo, Japan, whose patent work concerns semiconductor manufacturing and mask-alignment technology. He is associated with Canon Kabushiki Kaisha and has 3 patents.

Latest Patents

One of Konuki’s latest patents describes a semiconductor circuit manufacturing apparatus that aligns a mask pattern with selected zones on a wafer. The apparatus detects the relative position of the mask and the zone to be exposed, identifies the zone, and selects relevant detector outputs to determine positional deviation before exposure.

Another patent describes a mask aligner with a malfunction-disposal system. When the apparatus detects a malfunction, an operator can select from stored routines, and the aligner’s controller carries out the selected procedure.

Career Highlights

Konuki’s described inventions address precision and operational reliability in semiconductor production. His work focuses on aligning masks and wafers accurately and providing a structured response when alignment equipment malfunctions.

Collaborations

Konuki is associated with Canon Kabushiki Kaisha. His listed coworkers include Masao Kosugi and Naoki Ayata.

Conclusion

Tadashi Konuki’s patent work reflects contributions to semiconductor manufacturing equipment, particularly wafer alignment, exposure control, and malfunction handling.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…