The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 1988
Filed:
Jan. 22, 1987
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A semiconductor circuit manufacturing apparatus wherein a wafer has a plurality of zones to be exposed one by one to a pattern of a mask, including detector apparatus for detecting a relative position between the mask and a said zone to be exposed and producing outputs representative of the relative position; a device for exposing the said zone to the mask pattern after they are aligned; a device for producing information for identifying said zone which is going to be exposed; a selector, responsive to said information producing device, for selecting all or a part of the outputs of said detecting apparatus; and a device for determining, on the basis of the selected outputs of said detecting apparatus, a positional deviation between the mask pattern and the zone to be exposed thereto.