Tadashi Ikejiri

Title: The Innovative Mind of Tadashi Ikejiri

Introduction

Tadashi Ikejiri, a prolific inventor based in Kyoto, Japan, holds an impressive portfolio of 10 patents. His innovative contributions primarily focus on advancements in ion source technology and ion implantation apparatuses, which have significant implications in various industries, including semiconductor manufacturing and material science.

Latest Patents

Among his latest patents are the "Repeller Structure and Ion Source" and the "Ion Implanting Apparatus and Deflecting Electrode." The repeller structure patent describes a configuration within a plasma generating chamber of an ion source. It features a cathode that emits electrons to ionize a source gas, generating plasma. The innovative repeller structure reflects ions towards the cathode and includes a sputtering target designed to emit predetermined ions efficiently. The electrode body incorporated in this design enhances the functionality of the sputtering target, thus improving ion generation.

The "Ion Implanting Apparatus and Deflecting Electrode" patent outlines a system for accelerating ion beams extracted from sources. It includes an electrostatic accelerating tube equipped with deflecting electrodes that guide the ion beam accurately toward its target. The unique design enables independent control of electric potentials across its upstream and downstream electrodes, allowing for refined control over the ion beam trajectory.

Career Highlights

Tadashi Ikejiri has had a significant career, marked by his contributions to renowned companies such as Nissin Ion Equipment Co., Ltd. and Nissin Electric Co., Ltd. His work has been pivotal in advancing technology in ion implantation and plasma generation, showcasing his expertise and innovative spirit in the field.

Collaborations

Throughout his career, Ikejiri has collaborated with talented individuals, including coworkers Takatoshi Yamashita and Tetsuya Igo. Their collaborative efforts have contributed to the successful realization of various projects, particularly in developing cutting-edge ion source technologies.

Conclusion

Tadashi Ikejiri's work has made a lasting impact on the field of ion technology, demonstrated by his numerous patents and successful collaborations. As innovation continues to shape the future of technology, Ikejiri remains a key figure driving advancements that address the challenges of modern applications in the semiconductor industry and beyond.