Tsukuba, Japan

Tadanobu Arimura

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 44(Granted Patents)


Company Filing History:


Years Active: 2014-2024

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2 patents (USPTO):Explore Patents

Title: Tadanobu Arimura: Innovator in Semiconductor Cleaning Technologies

Introduction

Tadanobu Arimura is a notable inventor based in Tsukuba, Japan. He has made significant contributions to the field of semiconductor production through his innovative cleaning technologies. With a total of 2 patents, Arimura's work focuses on enhancing the efficiency and effectiveness of cleaning processes in semiconductor manufacturing.

Latest Patents

Arimura's latest patents include a cleaning apparatus for components of semiconductor production apparatuses, a cleaning method for these components, and a cleaning system designed for the same purpose. The primary objective of his inventions is to prevent the attachment of reaction products within the cleaning processing furnace using a simple structure. His cleaning apparatus comprises several key components, including a cleaning processing furnace, a heating device, gas introduction and discharge pipes, a decompression device, and temperature control devices. Additionally, he has developed a pressure swing adsorption-type gas separation method and apparatus, which effectively separates components based on their adsorbability.

Career Highlights

Tadanobu Arimura is currently employed at Taiyo Nippon Sanso Corporation, where he continues to innovate in the semiconductor field. His work has been instrumental in advancing cleaning technologies that are crucial for maintaining the integrity of semiconductor production processes.

Collaborations

Arimura has collaborated with several colleagues, including Masaya Yamawaki and Yoshio Ishihara. These partnerships have fostered a collaborative environment that enhances the development of innovative solutions in semiconductor cleaning technologies.

Conclusion

Tadanobu Arimura's contributions to semiconductor cleaning technologies demonstrate his commitment to innovation and excellence in the field. His patents reflect a deep understanding of the challenges faced in semiconductor production and offer practical solutions to improve efficiency.

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