Tadaaki Honma

Title: **The Innovative Contributions of Tadaaki Honma**

Introduction

Tadaaki Honma, located in Annaka, Japan, is an accomplished inventor known for his significant contributions to the field of thin film technology. With a total of two patents to his name, Honma's work has focused on enhancing the performance and uniformity of silicon single crystal thin films.

Latest Patents

Honma's latest inventions include an "Apparatus for thin film growth" and a "Silicon epitaxial wafer and production method therefor."

The first patent addresses an apparatus designed for the vapor phase growth of silicon single crystal thin films. This innovative device improves the in-plane uniformity of susceptor temperature, ensuring that the thickness of the silicon thin film is consistent. A notable feature of this invention is the use of a lift pin made from a material with lower thermal conductivity compared to the susceptor, effectively preventing local temperature drops during the manufacturing process. Preferred materials for the lift pin include silicon carbide (SiC), carbon of a desired grade, and quartz.

Honma's second patent aims to optimize the surface roughness distribution of silicon epitaxial wafers. By fine-tuning the temperature distribution across the surface of the susceptor used in the vapor phase thin film growth apparatus, Honma's methodology allows for a reduction in temperature variation to 7°C or less. This innovation achieves an impressive uniformity in surface roughness, maintaining parameters equal to or less than 0.02 ppm.

Career Highlights

Honma is affiliated with Shin-Etsu Handotai Co., Ltd., where he has dedicated his career to advancing semiconductor technology through innovative solutions. His research has made a profound impact on the efficiency and quality of silicon wafer production.

Collaborations

Throughout his career, Honma has collaborated with esteemed colleagues, including Takeshi Arai and Hitoshi Habuka. These partnerships have allowed for sharing of knowledge and expertise, significantly enhancing the development process and implementation of cutting-edge technologies in their field.

Conclusion

Tadaaki Honma’s contributions to the field of thin film technology highlight his innovative spirit and dedication to excellence. His patents not only reflect his expertise but also pave the way for advancements in semiconductor manufacturing processes. With a foundation built on collaboration and innovation, Honma continues to push the boundaries of technology in the semiconductor industry.