Taichung, Taiwan

Ta-Wei Ou


Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2021-2024

where 'Filed Patents' based on already Granted Patents

3 patents (USPTO):

Title: Innovations by Ta-Wei Ou in Electron Beam Lithography

Introduction

Ta-Wei Ou, an innovative inventor based in Taichung, Taiwan, has made significant contributions to the field of electron beam lithography. With a total of three patents to his name, Ou has demonstrated a strong commitment to advancing semiconductor manufacturing techniques, particularly in improving throughput.

Latest Patents

Among his latest patents, the innovative process titled "Dummy Insertion for Improving Throughput of Electron Beam Lithography" stands out. This patent outlines a method that enhances the performance of electron beam lithography systems. The process involves receiving an integrated circuit (IC) design layout containing a target pattern and employing a first exposure dose to create the desired pattern on a workpiece. A critical aspect of the method is the insertion of a dummy pattern into the IC design layout, which increases the pattern density to a threshold level. By modifying the IC design layout, the electron beam lithography system can then apply a second exposure dose that is lower than the initial dose, allowing for efficient formation of the target pattern.

Career Highlights

Ta-Wei Ou is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where his expertise in electron beam lithography has been instrumental in driving advancements within the semiconductor industry. His work focuses on refining technology to improve production efficiency and accuracy.

Collaborations

Ou collaborates with esteemed colleagues, including Wen Lo and Chun-Hung Liu, who share his passion for technological innovation in semiconductor processes. Their teamwork has contributed to the successful development and implementation of groundbreaking techniques within the industry.

Conclusion

Ta-Wei Ou's contributions to the field of electron beam lithography exemplify the role of inventors in driving technological progress. Through his innovative patents and collaborative spirit, he continues to influence the future of semiconductor manufacturing, ensuring that advancements in technology are sustained and built upon.

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