Taipei, Taiwan

Ta-Hsiang Kung

USPTO Granted Patents = 7 

Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 5(Granted Patents)


Location History:

  • Taipei, TW (2015)
  • New Taipei, TW (2015 - 2024)

Company Filing History:


Years Active: 2015-2025

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7 patents (USPTO):Explore Patents

Title: Ta-Hsiang Kung: Innovator in Semiconductor Technology

Introduction

Ta-Hsiang Kung is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of seven patents. His innovative work focuses on enhancing semiconductor device performance through advanced methods and materials.

Latest Patents

One of Ta-Hsiang Kung's latest patents is titled "Replacement gate methods that include treating spacers to widen gate." This method involves forming a dummy dielectric layer over a substrate and creating a dummy gate above it. The process includes forming a first spacer adjacent to the dummy gate and removing the dummy gate to create a cavity defined by the first spacer. A plasma treatment is then performed on portions of the first spacer, altering its material composition. The final steps involve etching the treated portions and filling the cavity with conductive materials to establish a gate structure.

Another notable patent is "Channel structures including doped 2D materials for semiconductor devices." This invention describes a semiconductor device that features a substrate and a semiconductor structure suspended above it. The structure includes a source region, a drain region, and a channel region that contains a doped two-dimensional (2D) material layer. The design aims to improve the efficiency and performance of semiconductor devices.

Career Highlights

Ta-Hsiang Kung is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing the company's technological capabilities and product offerings.

Collaborations

Throughout his career, Ta-Hsiang Kung has collaborated with several talented individuals, including Shu-Han Chen and Tsung-Ju Chen. These collaborations have fostered innovation and contributed to the development of cutting-edge semiconductor technologies.

Conclusion

Ta-Hsiang Kung's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor devices, showcasing the importance of innovation in technology.

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