Portland, OR, United States of America

Szyua S Liao


Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Szyua S Liao: Innovator in Integrated Circuit Structures

Introduction

Szyua S Liao is a prominent inventor based in Portland, OR (US). He has made significant contributions to the field of integrated circuit technology. His innovative work focuses on enhancing the functionality and performance of semiconductor devices.

Latest Patents

Szyua S Liao holds 1 patent for his invention related to integrated circuit structures. This patent encompasses integrated circuit cell architectures that include both front-side and back-side structures. The invention integrates various processes such as back-side implant, semiconductor deposition, dielectric deposition, metallization, film patterning, and wafer-level layer transfer with front-side processing. This double-side processing allows for the revealing of the back side of structures fabricated from the front-side of a substrate. Additionally, host-donor substrate assemblies are built up to support and protect front-side structures during back-side processing. Front-side devices, such as FETs, can be modified and interconnected during back-side processing, while back-side devices may be integrated with front-side devices to enhance device functionality, improve performance, or increase device density.

Career Highlights

Szyua S Liao is currently employed at Intel Corporation, where he continues to push the boundaries of integrated circuit technology. His work has been instrumental in advancing the capabilities of semiconductor devices.

Collaborations

Throughout his career, Szyua has collaborated with notable colleagues, including Bruce A Block and Valluri Ramana Rao. These collaborations have contributed to the development of innovative solutions in the field of integrated circuits.

Conclusion

Szyua S Liao is a key figure in the advancement of integrated circuit structures, with a focus on enhancing device performance and functionality. His contributions to the field are noteworthy and continue to influence the future of semiconductor technology.

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