Szu-Hsian Lee

Title: Innovations of Szu-Hsian Lee in Semiconductor Technology

Introduction

Szu-Hsian Lee is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Szu-Hsian Lee holds a patent for a semiconductor device and method for manufacturing the same. This semiconductor device features a source/drain portion, a metal silicide layer positioned over the source/drain portion, and a transition layer situated between the source/drain portion and the metal silicide layer. The transition layer incorporates implantation elements, with an atomic concentration of these elements being higher than that in both the source/drain portion and the metal silicide layer. This design effectively reduces the contact resistance between the source/drain portion and the metal silicide layer. The patent also discloses methods for manufacturing the semiconductor device.

Career Highlights

Szu-Hsian Lee is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to further develop his expertise and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Some of his coworkers include Shuen-Shin Liang and Min-Chiang Chuang, who collaborate with him on various projects within the semiconductor field.

Conclusion

Szu-Hsian Lee's innovative work in semiconductor technology, particularly his patented device and methods, showcases his significant contributions to the industry. His collaboration with esteemed colleagues further enhances the impact of his inventions.