Baoshan, Taiwan

Szu-Chien Wu

This inventor holds 1 USPTO granted patent and 5 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Szu-Chien Wu: Innovator in Semiconductor Technology

Introduction

Szu-Chien Wu is a prominent inventor based in Baoshan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Szu-Chien Wu holds a patent for a semiconductor structure that features both first and second silicide features, along with a method for manufacturing the same. This patent outlines a method that includes forming first and second fins over a substrate, which consist of alternating stacked semiconductor layers. The process also involves creating a dummy gate structure, forming source/drain features, and ultimately replacing the dummy gate structure with a gate structure that wraps around the semiconductor layers. This innovative approach enhances the performance and efficiency of semiconductor devices.

Career Highlights

Szu-Chien Wu is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has contributed to advancements in semiconductor manufacturing processes, showcasing his expertise and commitment to innovation.

Collaborations

Throughout his career, Szu-Chien Wu has collaborated with notable colleagues, including Chun-Yuan Chen and Lo-Heng Chang. These collaborations have fostered a productive environment for innovation and development in semiconductor technology.

Conclusion

Szu-Chien Wu's contributions to semiconductor technology through his patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as an influential inventor in the field. His innovative methods continue to shape the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
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