This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2007.
Company Filing History:
Years Active: 2007
Title: Innovations of Sze-Au Wu in Plasma Enhanced Chemical Vapor Deposition
Introduction
Sze-Au Wu is a notable inventor based in Yunlin, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of plasma enhanced chemical vapor deposition (PECVD). His innovative approaches have led to advancements in gas flow stability and film deposition processes.
Latest Patents
Sze-Au Wu holds a patent for a "Bypass gas feed system and method to improve reactant gas flow and film deposition." This invention addresses the challenges of achieving stable gas flow during PECVD processes. The method involves supplying a reactant gas flow at a selected rate to bypass the plasma reactor chamber temporarily. This approach helps in achieving predetermined flow rate stability and redirects the gas flow into the chamber for effective plasma processing.
Career Highlights
Sze-Au Wu is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work focuses on enhancing the efficiency and reliability of semiconductor manufacturing processes. His innovative solutions have contributed to the company's reputation for excellence in technology.
Collaborations
Sze-Au Wu has collaborated with talented individuals such as Yi-Lung Cheng and Mo-Chen Liao. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies in the semiconductor field.
Conclusion
Sze-Au Wu's contributions to the semiconductor industry through his innovative patent and collaborative efforts highlight his role as a key inventor in advancing PECVD technology. His work continues to influence the efficiency of semiconductor manufacturing processes.