Koufu, Japan

Syuji Mochizuki

This inventor holds 1 USPTO granted patent. Top assignees: Kabushiki Kaisha Toshiba, Tokyo Electron Limited, Tokyo Electron Yamanashi Limited. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Syuji Mochizuki. Retrieved from https://idiyas.com/inventor/syuji-mochizuki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Syuji Mochizuki: Innovator in Thin Film Technology

Introduction

Syuji Mochizuki is a notable inventor based in Koufu, Japan. He has made significant contributions to the field of thin film technology, holding a patent for a method of forming a thin film. His work has had a lasting impact on various industries that rely on advanced materials.

Latest Patents

Mochizuki holds 1 patent related to the method of forming a thin film. This innovation showcases his expertise and dedication to advancing technology in this area.

Career Highlights

Throughout his career, Syuji Mochizuki has worked with prominent companies such as Kabushiki Kaisha Toshiba and Tokyo Electron Limited. His experience in these organizations has allowed him to develop and refine his skills in the field of thin film technology.

Collaborations

Mochizuki has collaborated with notable professionals in his field, including Hitoshi Ito and Kyoichi Suguro. These partnerships have contributed to his success and the advancement of his inventions.

Conclusion

Syuji Mochizuki is a distinguished inventor whose work in thin film technology has made a significant impact. His contributions continue to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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