This inventor holds 1 USPTO granted patent. Top assignee: Hitachi-High-Technologies Corporation. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019
Title: Syuji Enokida: Innovator in Dry-Etching Technology
Introduction
Syuji Enokida is a prominent inventor based in Tokyo, Japan. He is known for his significant contributions to the field of plasma etching technology. His innovative approach has led to advancements in the manufacturing processes used in various industries.
Latest Patents
Enokida holds a patent for a dry-etching method that enhances the efficiency of plasma etching. This method allows for a vertical etching profile while maintaining selectivity relative to a mask. The patent describes a two-step process: the first involves etching a film using reactive gas to create a footing profile, and the second process utilizes sputtering etching to achieve a vertical profile.
Career Highlights
Syuji Enokida is associated with Hitachi High-Technologies Corporation, where he has been instrumental in developing cutting-edge technologies. His work has significantly impacted the semiconductor manufacturing industry, providing solutions that improve production quality and efficiency.
Collaborations
Enokida has collaborated with various professionals in his field, including his coworker Kenichi Kuwahara. Their joint efforts have contributed to the advancement of etching technologies and have fostered innovation within their organization.
Conclusion
Syuji Enokida's contributions to dry-etching technology exemplify the importance of innovation in the semiconductor industry. His patented methods continue to influence manufacturing processes, showcasing the vital role of inventors in technological advancement.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile