Location History:
- Nirasaki, JP (2019)
- Yamanashi, JP (2019)
Company Filing History:
Years Active: 2019
Title: Syuhei Yonezawa: Innovator in Semiconductor Technology
Introduction
Syuhei Yonezawa is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods and apparatuses for film formation.
Latest Patents
Yonezawa holds two patents that showcase his innovative work. His latest patents include a film forming method for boron films and a film forming apparatus. The method involves forming a boron film on a substrate where a semiconductor device is created. This is achieved by plasmarizing a reaction gas containing a boron-containing gas under a controlled process atmosphere with a pressure range of 0.67 to 33.3 Pa (5 to 250 mTorr). Additionally, he has developed a substrate processing method that utilizes a removal solution made from nitric acid, a stronger acid, and water to effectively remove a boron monofilm from a silicon-based film substrate.
Career Highlights
Yonezawa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work has been instrumental in advancing the technology used in semiconductor manufacturing.
Collaborations
He collaborates with talented coworkers, including Koji Kagawa and Kazuya Dobashi, who contribute to his innovative projects and research.
Conclusion
Syuhei Yonezawa's contributions to semiconductor technology through his patents and work at Tokyo Electron Limited highlight his role as a key innovator in the field. His advancements in film formation methods are paving the way for future developments in semiconductor devices.