Sylvia R Tousley

Title: Sylvia R. Tousley: Innovator in Semiconductor Technology

Introduction

Sylvia R. Tousley is a prominent inventor based in South Burlington, Vermont. She has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. Her work focuses on improving manufacturing processes and enhancing the efficiency of semiconductor production.

Latest Patents

Among her latest patents is a method and system for applying run rules on an individual part number basis. This invention aims to detect out-of-control events for a distinct sub-population within a general technology population. The process involves acquiring measurement data from a manufacturing line, retrieving specifications from a database, and executing custom run rules against the measured data. If a run rule violation exists, requests to process the part number are rejected.

Another notable patent is a method to define and tailor process-limited lithographic features using a modified hard mask process. This method is designed to form sub-lithographic spaces between features on a semiconductor wafer. It includes forming and patterning a mask on the wafer, creating spacers on the sidewalls of the mask, and transferring the pattern to an underlying layer.

Career Highlights

Sylvia R. Tousley is currently employed at International Business Machines Corporation (IBM), where she continues to innovate and contribute to advancements in semiconductor technology. Her expertise and dedication have made her a valuable asset to her team and the industry.

Collaborations

Some of her notable coworkers include Douglas S. Armbrust and Dale Warner Martin, who have collaborated with her on various projects and innovations.

Conclusion

Sylvia R. Tousley's contributions to semiconductor technology through her patents and work at IBM highlight her role as a leading inventor in the field. Her innovative methods continue to shape the future of manufacturing processes in the semiconductor industry.