International Business Machines Corporation

Sylvia R Tousley

Jed Hickory Rankin

Dale Warner Martin

Timothy E Neary

Paul William Pastel

Dinh Dang

Arthur C Winslow

Douglas S Armbrust

Michael E Bailey

Brian P Conchieri

James George Michael

Steven M Ruegsegger

Bryan L Rose

A method and system for applying run rules on an individual part number basis in order to detect out-of-control events for a distinct sub-population within a general technology population. The invention thus provides for line tailoring by part number by acquiring measurement data of the part number from a manufacturing line for a measured parameter; retrieving a specification for the part number from a database; executing custom run rules by part number against the measured data using the specifications; and rejecting requests to process the part number if a run rule violation exists.

Part number inhibit control

A method to define and tailor process limited lithographic features is provided. The method may be used to form sub lithographic spaces between features on a semiconductor wafer. A mask is formed and patterned on the wafer. Spacers are formed on sidewalls of the mask. The pattern of the mask and spacers is then transferred to an underlying layer.

Method to define and tailor process limited lithographic features using a modified hard mask process

In a plasma or RIE etching tool using a uniquely designed annulus around a wafer supporting pedestal, it has been found that the introduction of one or more gases in the region immediately adjacent the annulus controls the amount of etching of features in that region in the surface of the wafer mounted on the pedestal. By so controlling the amount of gas in this region, the slope of the walls of the etched features can be also controlled.

Symmetrical etching ring with gas control

Growing community of inventors

South Burlington, VT, United States of America

Sylvia R Tousley