The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 1996
Filed:
Nov. 03, 1993
Michael E Bailey, Northfield, VT (US);
Dinh Dang, Essex Junction, VT (US);
James G Michael, Burlington, VT (US);
Timothy E Neary, Essex Junction, VT (US);
Paul W Pastel, Essex Junction, VT (US);
Sylvia R Tousley, South Burlington, VT (US);
Arthur C Winslow, Essex Junction, VT (US);
International Business Machines Corp., Armonk, NY (US);
Abstract
In a plasma or RIE etching tool using a uniquely designed annulus around a wafer supporting pedestal, it has been found that the introduction of one or more gases in the region immediately adjacent the annulus controls the amount of etching of features in that region in the surface of the wafer mounted on the pedestal. By so controlling the amount of gas in this region, the slope of the walls of the etched features can be also controlled.