The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 1996

Filed:

Nov. 03, 1993
Applicant:
Inventors:

Michael E Bailey, Northfield, VT (US);

Dinh Dang, Essex Junction, VT (US);

James G Michael, Burlington, VT (US);

Timothy E Neary, Essex Junction, VT (US);

Paul W Pastel, Essex Junction, VT (US);

Sylvia R Tousley, South Burlington, VT (US);

Arthur C Winslow, Essex Junction, VT (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
1566431 ; 156345 ; 1187 / ;
Abstract

In a plasma or RIE etching tool using a uniquely designed annulus around a wafer supporting pedestal, it has been found that the introduction of one or more gases in the region immediately adjacent the annulus controls the amount of etching of features in that region in the surface of the wafer mounted on the pedestal. By so controlling the amount of gas in this region, the slope of the walls of the etched features can be also controlled.


Find Patent Forward Citations

Bailey, Michael. (1996). Symmetrical etching ring with gas control (U.S. Patent No. 5498313). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5498313

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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