Sylvia Baumann Winter

Title: Sylvia Baumann Winter: Innovator in Semiconductor Technology

Introduction

Sylvia Baumann Winter is a prominent inventor based in Laussnitz, Germany. She has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. Her innovative work has paved the way for advancements in the manufacturing and design of semiconductor devices.

Latest Patents

Among her latest patents is the "Crack stop barrier and method of manufacturing thereof." This patent describes a semiconductor device that includes a chip, a first kerf adjacent to the chip with a first main direction, and a second kerf with a second main direction. A kerf junction is formed by the intersection of the first and second kerfs, with a crack stop barrier located along a portion of the perimeter of this junction. Another notable patent is also titled "Crack stop barrier and method of manufacturing thereof," which discloses a wafer comprising multiple chips and kerfs. Each kerf separates one chip from another and includes a crack stop barrier, showcasing her innovative approach to enhancing semiconductor reliability.

Career Highlights

Throughout her career, Sylvia has worked with leading companies in the semiconductor industry, including Infineon Technologies AG and Disco Hi-Tec Europe GmbH. Her experience in these organizations has allowed her to develop and refine her inventions, contributing to the advancement of semiconductor technology.

Collaborations

Sylvia has collaborated with notable professionals in her field, including Barbara Vasquez and David Wallis. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Sylvia Baumann Winter's contributions to semiconductor technology through her patents and collaborations highlight her role as an influential inventor. Her work continues to impact the industry, paving the way for future innovations.