Company Filing History:
Years Active: 2021-2024
Title: Sven Martin: Innovator in Semiconductor Lithography
Introduction
Sven Martin is a notable inventor based in Jena, Germany. He has made significant contributions to the field of semiconductor lithography, holding three patents that showcase his innovative spirit and technical expertise.
Latest Patents
One of Sven Martin's latest patents is a "Method for measuring a substrate for semiconductor lithography." This method involves a measuring device that captures at least a partial region of the substrate while varying the distance between the substrate and an imaging optical unit. Another important patent is the "Device and method for characterizing a microlithographic mask." This invention includes an illumination optical unit for illuminating mask structures, a detector unit, and an evaluation unit for analyzing the data recorded by the detector unit. The detector unit is designed to spatially resolve both the intensity and polarization state of the light emanating from the mask.
Career Highlights
Sven Martin is currently employed at Carl Zeiss SMT GmbH, a company renowned for its advancements in optical systems and semiconductor manufacturing technologies. His work at this prestigious organization has allowed him to push the boundaries of innovation in lithography.
Collaborations
Sven collaborates with talented individuals such as Ulrich Matejka and Oliver Jaeckel, contributing to a dynamic team focused on advancing semiconductor technologies.
Conclusion
Sven Martin's contributions to semiconductor lithography through his patents and work at Carl Zeiss SMT GmbH highlight his role as a key innovator in the field. His inventions continue to influence the industry and pave the way for future advancements.