Susumu Takada

Title: Susumu Takada: Innovator in Semiconductor Manufacturing

Introduction

Susumu Takada is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 2 patents. His work focuses on innovative methods for creating semiconductor devices and thin films, which are essential in modern electronics.

Latest Patents

Takada's latest patents include a "Method of Manufacturing Semiconductor Device" and a "Method of Forming Metal Oxide Film." The first patent describes a process that involves supplying a precursor gas containing a metal complex into a chamber to form a precursor layer on a workpiece. This is followed by the introduction of an oxidizing gas to oxidize the precursor layer, resulting in the formation of a metal oxide layer. The process also includes cycles of supplying an HO removal gas to ensure the quality of the metal oxide layer.

The second patent outlines a method and apparatus for forming a thin film using an organic metal compound gas and oxidizing agents. This method consists of a first film formation process, an annealing process with a stronger oxidizing agent, and a second film formation process to enhance the thin film's properties.

Career Highlights

Susumu Takada is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work at the company has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.

Collaborations

Takada has collaborated with notable coworkers, including Katsushige Harada and Taiki Kato. Their combined expertise contributes to the advancement of technology in their field.

Conclusion

Susumu Takada's contributions to semiconductor manufacturing through his innovative patents and work at Tokyo Electron Limited highlight his importance in the industry. His advancements in methods for creating semiconductor devices and thin films continue to influence modern electronics.