Susumu Kohyama

Title: Susumu Kohyama: Innovator in Semiconductor Technology

Introduction

Susumu Kohyama is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work has been instrumental in advancing the capabilities of electronic devices.

Latest Patents

Kohyama's latest patents include an innovative EEPROM with a sidewall control gate. This semiconductor device features a control gate electrode and a floating gate electrode, with the floating gate formed on one side wall of the control gate through an insulating film. Another notable patent is a method for manufacturing a semiconductor device that involves gas phase growth of a polysilicon layer on a semiconductor substrate. This method allows for the formation of a silicon layer of a single-crystal structure on the exposed surface of the substrate, ensuring that the resulting semiconductor device, such as an MOS transistor, is free from differences in level between element regions and element isolation regions.

Career Highlights

Throughout his career, Kohyama has worked with notable companies, including Tokyo Shibaura Electric Co., Ltd. and Toshiba Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Kohyama has collaborated with esteemed colleagues, including Yoshihisa Mizutani and Koji Makita. These partnerships have further enriched his work and contributions to the field.

Conclusion

Susumu Kohyama's innovative work in semiconductor technology has led to significant advancements in the industry. His patents and collaborations reflect his dedication to improving electronic devices and their functionalities.