Susheng Chang

Title: Susheng Chang: Innovator in Semiconductor Technology

Introduction

Susheng Chang is a prominent inventor based in Hefei, China. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in device fabrication.

Latest Patents

Susheng Chang holds a patent for a "Method for preparing semiconductor device." This method involves providing a substrate and forming a first dielectric layer on one side of the substrate. The substrate includes an array area and a peripheral area arranged outside of the array area. The process includes forming an initial mask pattern on one side of the first dielectric layer away from the substrate. At least two patterning processes are performed on the initial mask pattern to create a first mask pattern in the array area and a second mask pattern in the peripheral area. The first mask pattern has a first height, while the second mask pattern has a second height, which is greater than the first height. Both the array area and the peripheral area are exposed using each of the at least two patterning processes. Susheng Chang has 1 patent to his name.

Career Highlights

Susheng Chang is currently employed at Changxin Memory Technologies, Inc. His work focuses on developing advanced semiconductor devices. His expertise in this field has made him a valuable asset to his company.

Collaborations

Some of his notable coworkers include Bin Yang and Tianlei Mu. Their collaboration has contributed to the success of various projects within the company.

Conclusion

Susheng Chang's innovative methods in semiconductor technology highlight his role as a key inventor in the industry. His contributions continue to influence advancements in device fabrication.