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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12243743 B1

PDFFull Text
Date of Patent:
Mar. 04, 2025

Filed:

Sep. 28, 2021

Method for preparing semiconductor device

Applicant:

Changxin Memory Technologies, Inc., Hefei, CN;

Inventors:

Susheng Chang, Hefei, CN;

Tianlei Mu, Hefei, CN;

Bin Yang, Hefei, CN;

Assignee:

CHANGXIN MEMORY TECHNOLOGIES, INC., Hefei, CN;

Attorneys:

Syncoda LLC

Feng Ma

Primary Examiner:

Jose R Diaz

Int. Cl.
CPC ...
H01L 21/033 (2006.01); H01L 21/027 (2006.01); H01L 21/308 (2006.01); H10B 12/00 (2023.01);
U.S. Cl.
CPC ...
H01L 21/0337 (2013.01); H01L 21/0273 (2013.01); H01L 21/0276 (2013.01); H01L 21/3086 (2013.01); H10B 12/09 (2023.02);
Abstract

A method for preparing a semiconductor device is provided. The method for preparing the semiconductor device includes: providing a substrate, and forming a first dielectric layer on one side of the substrate, where the substrate includes an array area and a peripheral area arranged outside of the array area; forming an initial mask pattern on one side of the first dielectric layer away from the substrate; performing at least two patterning processes on the initial mask pattern, to form a first mask pattern in the array area and to form a second mask pattern in the peripheral area. The first mask pattern has a first height, the second mask pattern has a second height, and the second height is greater than the first height. Both of the array area and the peripheral area are exposed by using each of the at least two patterning processes.

Find Patent Forward Citations

Chang, Susheng. (2025). Method for preparing semiconductor device (U.S. Patent No. 12243743). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12243743

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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