Munich, Germany

Susanne Kornely



Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 19(Granted Patents)


Location History:

  • Munchen, DE (2000)
  • München, DE (2011 - 2012)
  • Munich, DE (2012 - 2016)

Company Filing History:


Years Active: 2000-2016

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6 patents (USPTO):Explore Patents

Title: Innovations by Susanne Kornely: Pioneering Developments in Microscreens

Introduction: Susanne Kornely, an accomplished inventor based in Munich, Germany, has made significant contributions to the field of microscreen technology. With six patents to her name, her innovative methods have paved the way for advancements in various applications.

Latest Patents: Susanne’s recent patents focus on methods for producing microscreens. The first method describes a process where a photoresist layer is applied to a support using a liquid photoresist. By partially covering this layer with a mask that defines the microscreen structure, the photoresist is then exposed to radiation. This is followed by developing the photoresist and removing it from the support. The second patent elaborates on a similar method, emphasizing the application of a photoresist layer with a definable thickness to the support. In this process, radiation exposure is controlled using a mask, allowing precise development of the microscreen.

Career Highlights: Susanne Kornely's career is marked by her role at Siemens Aktiengesellschaft, a renowned technology company. Her work there has not only solidified her reputation as an influential inventor but also underscored the importance of innovation in modern technology.

Collaborations: Throughout her career, Susanne has collaborated with talented individuals such as Axel Ganster and Carsten Schuh. These partnerships have fostered an environment of shared knowledge and innovation, contributing to their collective achievements in the field.

Conclusion: Susanne Kornely’s innovative methods for producing microscreens exemplify the importance of creativity and technical expertise in today’s technological landscape. Her work continues to inspire fellow inventors and signifies the ongoing evolution in the world of patents and inventions.

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