Susan V DiMeo

Title: Susan V DiMeo: Innovator in Silicon Precursor Compositions

Introduction

Susan V DiMeo is a prominent inventor based in New City, NY (US). She has made significant contributions to the field of microelectronics through her innovative work on silicon precursor compositions. Her expertise and dedication to advancing technology have led to the development of valuable patents that enhance manufacturing processes in the industry.

Latest Patents

Susan holds a patent for "Silylene compositions and methods of use thereof." This patent describes a silicon precursor composition that includes a silylene compound. The silylene compounds are utilized to form high purity, conformal silicon-containing films such as SiO, SiN, SiC, and doped silicates. These films are essential in the manufacture of microelectronic device products through various vapor deposition processes, including CVD, pulsed CVD, ALD, and pulsed plasma processes. Notably, her invention allows for the sealing of porosity in substrates comprising porous silicon oxide at low temperatures, ranging from 50°C to 200°C.

Career Highlights

Susan is currently employed at Entegris, Inc., where she continues to innovate and contribute to the field of microelectronics. Her work has not only advanced the technology but has also positioned her as a key player in the industry. With her patent, she has demonstrated her ability to address complex challenges in silicon film deposition.

Collaborations

Throughout her career, Susan has collaborated with notable colleagues, including Thomas M Cameron and Bryan Clark Hendrix. These partnerships have fostered an environment of innovation and have led to the successful development of her patented technologies.

Conclusion

Susan V DiMeo is a trailblazer in the field of silicon precursor compositions, with a patent that significantly impacts microelectronic manufacturing processes. Her contributions continue to shape the industry and inspire future innovations.