Sunil Kumar Garg

Title: Sunil Kumar Garg: Innovator in Optical Emission Spectroscopy

Introduction

Sunil Kumar Garg is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of optical emission spectroscopy, particularly in the context of gas flow control in processing chambers. With a total of 3 patents, his work has advanced the technology used in various industrial applications.

Latest Patents

One of his latest patents focuses on "Optical emission spectroscopy control of gas flow in processing chambers." This innovative system is designed to monitor the amount of a gas species in a processing chamber using Optical Emission Spectrometry. The gas measurement serves as feedback to a control process that generates a target setpoint for a gas flow controller. This real-time process allows for the adjustment of the gas flow rate to maintain a deposition mode within a transition region between primarily metallic and primarily compound deposition.

Another significant patent involves "Methods and apparatus to prevent interference between processing chambers." This invention describes methods to minimize electromagnetic interference between adjacent process chambers in a cluster tool. The start time of the subject recipe is controlled based on the electromagnetic process window of the subject chamber and its adjacent chambers. This control prevents temporal overlap of the electromagnetic windows, ensuring efficient operation.

Career Highlights

Sunil Kumar Garg is currently employed at Applied Materials, Inc., where he continues to innovate and develop new technologies. His work has been instrumental in enhancing the efficiency and effectiveness of processing chambers used in various manufacturing processes.

Collaborations

Throughout his career, Sunil has collaborated with several talented individuals, including Paul Kiely and Fuhong Zhang. These collaborations have contributed to the advancement of technologies in their respective fields.

Conclusion

Sunil Kumar Garg is a distinguished inventor whose work in optical emission spectroscopy has led to significant advancements in gas flow control and interference prevention in processing chambers. His contributions continue to impact the industry positively.