Applied Materials, Inc.

Sunil Kumar Garg

Paul Kiely

Martin Lee Riker

Zheng Wang

Fuhong Zhang

Xiaodong Wang

William Fruchterman

Keith A Miller

Philip DiGiacomo

Rajat Agrawal

Abhay Vardhan

A system may be configured to monitor an amount of a gas species in a processing chamber using Optical Emission Spectrometry. The gas measurement may be provided as feedback to a control process that generates a target setpoint for a gas flow controller into the process chamber. This real-time process may increase/decrease the flow rate of the gas in order to maintain a process deposition mode within a transition region between primarily metallic deposition and primarily compound deposition.

Optical emission spectroscopy control of gas flow in processing chambers

Methods and apparatus to minimize electromagnetic interference between adjacent process chambers of a cluster tool are described. The start time of the subject recipe is controlled based on the electromagnetic process window of the subject process chamber, the electromagnetic window of the first adjacent process chamber and of an optional second adjacent process chamber. The start time of the subject process chamber is controlled to prevent temporal overlap of the electromagnetic window of the subject chamber with the electromagnetic window of an adjacent chamber.

Methods and apparatus to prevent interference between processing chambers

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Santa Clara, CA, United States of America

Sunil Kumar Garg