The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2024

Filed:

Mar. 11, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Philip DiGiacomo, Palo Alto, CA (US);

Sunil Kumar Garg, Santa Clara, CA (US);

Paul G. Kiely, Santa Cruz, CA (US);

Keith A. Miller, Sunnyvale, CA (US);

Rajat Agrawal, Bangalore, IN;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05D 11/13 (2006.01); G05B 15/02 (2006.01); G01N 21/67 (2006.01);
U.S. Cl.
CPC ...
G05D 11/138 (2013.01); G01N 21/67 (2013.01); G05B 15/02 (2013.01);
Abstract

A system may be configured to monitor an amount of a gas species in a processing chamber using Optical Emission Spectrometry. The gas measurement may be provided as feedback to a control process that generates a target setpoint for a gas flow controller into the process chamber. This real-time process may increase/decrease the flow rate of the gas in order to maintain a process deposition mode within a transition region between primarily metallic deposition and primarily compound deposition.


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