Sung-Yong Moon

Title: Innovations of Sung-Yong Moon

Introduction

Sung-Yong Moon is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on methods for fabricating photomask layouts and semiconductor devices, showcasing his expertise in this critical area of innovation.

Latest Patents

Sung-Yong Moon's latest patents include a "Method for fabricating photomask layout" and a "Method for fabricating a semiconductor device using the same." The first patent outlines a process that involves receiving a first layout with a main pattern, generating a second layout by incorporating an assist feature based on the optical properties of the main pattern, and performing optical proximity correction (OPC) to produce a third layout. This third layout is then utilized as an etching mask for semiconductor films. The second patent focuses on correcting a mask layout by providing a mask layout with first patterns, obtaining topography data on a wafer region, generating a defocus map, and adjusting the mask layout based on this map to ensure optimal performance.

Career Highlights

Throughout his career, Sung-Yong Moon has worked with prominent companies, including Samsung Electronics Co., Ltd. and Samsung Electronics Ltd. His experience in these leading organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Sung-Yong Moon has collaborated with talented individuals such as Changhwan Kim and Sooryong Lee. These partnerships have likely enhanced his innovative capabilities and led to the development of impactful technologies.

Conclusion

Sung-Yong Moon's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in the industry, showcasing the importance of innovation in technology.