Sung-Kee Han

Title: The Innovative Contributions of Sung-Kee Han

Introduction

Sung-Kee Han is a prominent inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

One of his latest patents involves a semiconductor device designed to reduce leakage current while increasing capacitance without raising the equivalent oxide thickness (EOT). This innovative method includes providing a substrate with a dummy gate pattern, forming a gate forming trench, and creating a stacked insulation layer within the trench. The stacked insulation layer consists of multiple high-k dielectric layers, with the final layer having a dielectric constant of 40 or higher. Another notable patent features a semiconductor that includes a channel region in a substrate, a gate dielectric film, and a gate made from a doped metal nitride film. This gate structure is enhanced with a conductive polysilicon layer and may also include a metal-containing capping layer.

Career Highlights

Sung-Kee Han is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor innovation. His work has been instrumental in developing advanced technologies that are crucial for modern electronic devices.

Collaborations

He has collaborated with notable colleagues, including Hyung-suk Jung and Jong-Ho Lee, contributing to a dynamic research environment that fosters innovation.

Conclusion

Sung-Kee Han's contributions to semiconductor technology exemplify the spirit of innovation. His patents reflect a commitment to advancing the field and improving device performance.