Sung-Hyun Choi

Title: Innovations of Sung-Hyun Choi

Introduction

Sung-Hyun Choi is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on advanced semiconductor devices and manufacturing methods that enhance performance and efficiency.

Latest Patents

One of his latest patents involves semiconductor devices and methods of manufacturing the same. This patent describes a semiconductor device that includes an active fin on a substrate, a gate structure on the active fin, a gate spacer structure on the sidewall of the gate structure, and a source/drain layer on at least a portion of the active fin adjacent to the gate spacer structure. The gate spacer structure features a wet etch stop pattern, an oxygen-containing silicon pattern, and an outgas sing prevention pattern that are sequentially stacked. Another notable patent details methods of fabricating a SiOCN layer using a first and second carbon precursor, where the first carbon precursor is different from the second. This method includes providing a substrate, a silicon precursor, an oxygen reactant, a first carbon precursor, a second carbon precursor, and a nitrogen reactant onto the substrate.

Career Highlights

Sung-Hyun Choi has worked with leading companies in the technology sector, including Samsung Electronics Co., Ltd. and Samsung SDI Co., Inc. His experience in these organizations has allowed him to develop innovative solutions that address complex challenges in semiconductor manufacturing.

Collaborations

Throughout his career, he has collaborated with notable colleagues such as Yong-Suk Tak and Bon-Young Koo. These partnerships have contributed to the advancement of semiconductor technologies and the successful development of new patents.

Conclusion

Sung-Hyun Choi's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor devices and manufacturing methods.