Sung Hoon Jin

Title: Innovations of Sung Hoon Jin in Chemical-Mechanical Polishing

Introduction

Sung Hoon Jin is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of chemical-mechanical polishing (CMP) with his innovative patents. His work focuses on enhancing the efficiency and quality of polishing processes, which are crucial in various manufacturing applications.

Latest Patents

Sung Hoon Jin holds 2 patents that showcase his expertise in CMP technology. His latest patents include a chemical-mechanical polishing particle and a polishing slurry composition comprising the same. The first patent provides CMP particles that exhibit a high polishing rate and quality, generating fewer defects or scratches due to their modified surface. The second patent discloses a polishing slurry composition that maintains a stable pH over time under acidic conditions, making it easy to store for extended periods. This composition includes an abrasive, a specific amount of an aluminum component, and water, ensuring optimal performance in polishing applications.

Career Highlights

Sung Hoon Jin is currently employed at Dongjin Semichem Co., Ltd., where he continues to develop innovative solutions in the field of chemical-mechanical polishing. His work has significantly impacted the efficiency and effectiveness of polishing processes in various industries.

Collaborations

Throughout his career, Sung Hoon Jin has collaborated with talented individuals such as Jong Dai Park and Min Gun Lee. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Sung Hoon Jin's contributions to the field of chemical-mechanical polishing through his patents and collaborations highlight his role as a leading inventor in this domain. His work continues to influence the industry, paving the way for advancements in polishing technologies.