Lexington, MA, United States of America

Sung-Cheon Ko

This inventor holds 1 USPTO granted patent. Top assignee: Varian Semiconductor Equipment Associates, Inc.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sung-Cheon Ko. Retrieved from https://idiyas.com/inventor/sung-cheon-ko

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: The Innovations of Sung-Cheon Ko

Introduction

Sung-Cheon Ko is a notable inventor based in Lexington, MA (US). He has made significant contributions to the field of plasma ion implantation systems. His work focuses on enhancing fault detection and process control in semiconductor manufacturing.

Latest Patents

Sung-Cheon Ko holds 1 patent for his invention titled "Monitoring plasma ion implantation systems for fault detection and process control." This innovative system includes a process chamber, a source for producing plasma, a platen for holding a substrate, and a pulse source for generating implant pulses. The system is designed to measure ion mass and energy in the process chamber, allowing for improved monitoring and analysis of operating conditions.

Career Highlights

Sung-Cheon Ko is currently employed at Varian Semiconductor Equipment Associates, Inc. His work at this company has positioned him as a key player in the development of advanced semiconductor manufacturing technologies. His expertise in plasma ion implantation systems has been instrumental in driving innovation in this field.

Collaborations

Throughout his career, Sung-Cheon Ko has collaborated with notable colleagues such as Edmund Jacques Winder and Bon Woong Koo. These collaborations have contributed to the advancement of technologies in semiconductor manufacturing.

Conclusion

Sung-Cheon Ko's contributions to the field of plasma ion implantation systems demonstrate his commitment to innovation and excellence in semiconductor technology. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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