Company Filing History:
Years Active: 2004-2005
Title: Innovations of Sun-Seok Han
Introduction
Sun-Seok Han is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of engineering, particularly in the development of advanced technologies. With a total of 2 patents to his name, Han continues to push the boundaries of innovation.
Latest Patents
One of his latest patents is an electrostatic chuck designed to prevent an arc. This innovative device includes a metal plate and a dielectric layer, which features a lift pin hole and an injection hole for cooling gas. The design incorporates a lift pin that moves up and down through the lift pin hole, along with first and second protection insulators on the inner surfaces of the respective holes.
Another significant patent is an impedance matching circuit for an inductively coupled plasma source. This circuit consists of a first network with a first coil and an RF power supply that applies a first voltage to the coil. Additionally, a second network includes a grounded second coil with a lower second voltage. The circuit also features first and second reactive elements connected to the second coil, with a load connected to the other end portions of these elements, ensuring that the phases at both ends of the load differ from each other.
Career Highlights
Sun-Seok Han is currently employed at Jusung Engineering Co., Ltd., where he applies his expertise in engineering and innovation. His work at the company has allowed him to develop cutting-edge technologies that have practical applications in various industries.
Collaborations
Han collaborates with talented coworkers, including Gi-Chung Kwon and Hong-Sik Byun. Their combined efforts contribute to the advancement of technology and innovation within their field.
Conclusion
Sun-Seok Han is a distinguished inventor whose work has led to significant advancements in engineering. His patents reflect his commitment to innovation and his ability to solve complex problems through technology.