Jusung Engineering Co., Ltd.

Sun-Seok Han

Gi-Chung Kwon

Hong-Seub Kim

Bu-Jin Ko

Joung-Sik Kim

Hong-Sik Byun

Sung-Weon Lee

An electrostatic chuck includes: a metal plate; a dielectric layer on the metal plate, the dielectric layer and the metal plate having a lift pin hole and an injection hole of a cooling gas; a lift pin moving up-and-down through the lift pin hole; first protection insulator on an inner surface of the lift pin hole; and second protection insulator on an inner surface of the injection hole.

Electrostatic chuck for preventing an arc

An impedance matching circuit for a plasma source includes: a first network including: a first coil; and a RF power supply applying a first voltage to the first coil; and a second network including; a second coil grounded having a second voltage, the second voltage being lower than the first voltage; first and second reactive elements, one end portion of the first and second reactive elements being connected to each end portion of the second coil, respectively; and a load connected to the other end portions of the first and second reactive elements, phases at two end portions of the load being different from each other.

Impedance matching circuit for inductively coupled plasma source

Growing community of inventors

Gyeonggi-do, South Korea

Sun-Seok Han