Sun-Jung Lee

Title: Sun-Jung Lee: Innovator in Coating Compositions

Introduction

Sun-Jung Lee is a notable inventor based in Gyeonggi-Do, South Korea. She has made significant contributions to the field of coating compositions, particularly in the area of photoresist technology. Her innovative work has led to the development of a patent that enhances the performance of overcoated photoresist layers.

Latest Patents

Sun-Jung Lee holds a patent for "Coating compositions for use with an overcoated photoresist." This patent involves organic coating compositions, specifically antireflective coating compositions that include a surface agent of the Formula (I). In this formula, A and B can be independently hydrogen, optionally substituted alkyl, or optionally substituted aryl. Additionally, X and Y can also be independently hydrogen, optionally substituted alkyl, or optionally substituted carbocyclic aryl, with n being a positive integer. The preferred coating compositions provide an improved pattern collapse margin for an overcoated photoresist layer. She has 1 patent to her name.

Career Highlights

Sun-Jung Lee is currently employed at Rohm and Haas Electronic Materials Korea Ltd. Her work at this company has allowed her to focus on innovative solutions in the field of electronic materials. Her expertise in coating compositions has positioned her as a valuable asset in her industry.

Collaborations

Throughout her career, Sun-Jung Lee has collaborated with talented individuals such as Jihoon Kang and Dong-Je Hong. These collaborations have contributed to her success and the advancement of her research in coating technologies.

Conclusion

Sun-Jung Lee is a pioneering inventor whose work in coating compositions has made a significant impact in the field of photoresist technology. Her innovative patent demonstrates her commitment to advancing electronic materials.