The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2023

Filed:

Dec. 28, 2015
Applicant:

Rohm and Haas Electronic Materials Korea Ltd., Ghungcheongnam-Do, KR;

Inventors:

Sun-Jung Lee, Gyeonggi-Do, KR;

Jihoon Kang, Seoul, KR;

Dong-Je Hong, Gyeonggi-Do, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/32 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/325 (2013.01);
Abstract

Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a surface agent of the Formula (I). where A and B are each independently hydrogen, optionally substituted alkyl or optionally substituted aryl; X and Y are each independently hydrogen, optionally substituted alkyl or optionally substituted carbocyclic aryl; and n is a positive integer. Preferred coating compositions can provide improved pattern collapse margin of an overcoated photoresist layer.


Find Patent Forward Citations

Lee, Sun-Jung. (2023). Coating compositions for use with an overcoated photoresist (U.S. Patent No. 11762292). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11762292

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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