Rohm and Haas Electronic Materials Korea Ltd.

Sun-Jung Lee

Jihoon Kang

Dong-Je Hong

Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a surface agent of the Formula (I). where A and B are each independently hydrogen, optionally substituted alkyl or optionally substituted aryl; X and Y are each independently hydrogen, optionally substituted alkyl or optionally substituted carbocyclic aryl; and n is a positive integer. Preferred coating compositions can provide improved pattern collapse margin of an overcoated photoresist layer.

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Gyeonggi-Do, South Korea

Sun-Jung Lee