Sun-Ha Hwang

Sun-Ha Hwang is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of MOS capacitors and image sensors. With a total of 4 patents to his name, Hwang continues to push the boundaries of innovation in his industry.

Latest Patents

Hwang's latest patents include advancements in MOS capacitors and image sensors. The MOS capacitor patent describes a structure that includes an isolation layer formed in a substrate, defining an active region. It features a first electrode within the active region, which includes an impurity region spaced from the isolation layer, and a second electrode formed over the substrate that overlaps the impurity region. This design incorporates a gate with multiple adjacent gate patterns separated by gaps. The image sensor patent outlines a pixel array consisting of unit pixels arranged in two dimensions. Each unit pixel includes a substrate with a photoelectric conversion element, a recess pattern overlapping the conversion element, and multiple gates arranged in diagonal directions to enhance functionality.

Career Highlights

Sun-Ha Hwang is currently employed at SK Hynix Inc., a leading semiconductor company. His work at SK Hynix has allowed him to collaborate on cutting-edge technologies that are essential for modern electronic devices. Hwang's expertise in semiconductor design has positioned him as a key player in the industry.

Collaborations

Hwang has worked alongside talented colleagues such as Sang-Uk Park and Ho-Ryeong Lee. Their collaborative efforts have contributed to the successful development of innovative technologies in the semiconductor field.

Conclusion

Sun-Ha Hwang's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry and pave the way for future innovations.