The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 2015

Filed:

Dec. 26, 2013
Applicant:

SK Hynix Inc., Gyeonggi-do, KR;

Inventor:

Sun-Ha Hwang, Gyeonggi-do, KR;

Assignee:

SK Hynix Inc., Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/088 (2006.01); H01L 27/11 (2006.01); H01L 27/092 (2006.01); G11C 11/41 (2006.01); G11C 11/40 (2006.01); G11C 11/412 (2006.01); H01L 27/02 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1104 (2013.01); G11C 11/40 (2013.01); G11C 11/41 (2013.01); G11C 11/412 (2013.01); H01L 27/0207 (2013.01); H01L 27/092 (2013.01); H01L 27/11 (2013.01);
Abstract

A semiconductor device includes a first and a second active regions having a first conductive type and a second conductive type, respectively, being arranged in a first direction; a gate extending in the first direction; a first and a second channel regions defined under the gate in the first and the active regions, respectively; a first low-concentration doped region, having the second conductive type, formed at sides of the gate in the first active region and a first high-concentration doped region, having the second conductive type, formed at sides of the first low-concentration doped region in the first active region; and a second low-concentration doped region, having the first conductive type, formed at sides of the gate in the second active region and a second high-concentration doped region, having the first conductive type, formed at sides of the second low-concentration doped region in the second active region.


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