This inventor holds 6 USPTO granted patents and 2 published patent applications. Top assignee: Semes Co., Ltd.. Active years: 2024-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024-2025
Title: Innovations by Suk Won Jang in Droplet Analysis Technology
Introduction
Suk Won Jang is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of droplet analysis technology, holding a total of 6 patents. His work focuses on enhancing the precision and efficiency of substrate treatment processes.
Latest Patents
One of Suk Won Jang's latest patents is a droplet analysis unit and substrate treatment apparatus. This innovative unit is capable of measuring and digitizing the meniscus shape, motion, and position of ink droplets. The substrate treatment apparatus includes a process treatment unit that supports a substrate during treatment, an inkjet head unit that ejects a substrate treatment liquid using multiple nozzles, and a gantry unit that moves the inkjet head over the substrate. The droplet analysis unit measures the meniscus in each nozzle associated with the substrate treatment liquid, quantifying three-dimensional (3D) information regarding the meniscus based on chromatic aberration.
Career Highlights
Suk Won Jang is currently employed at Semes Co., Ltd., where he continues to develop innovative technologies in the field. His expertise in droplet analysis has positioned him as a key figure in advancing substrate treatment methodologies.
Collaborations
Throughout his career, Suk Won Jang has collaborated with talented individuals such as Won Yong Jin and Jae Duck Lee. These collaborations have contributed to the successful development of his patented technologies.
Conclusion
Suk Won Jang's contributions to droplet analysis technology demonstrate his commitment to innovation and excellence in the field. His patents reflect a deep understanding of the complexities involved in substrate treatment processes, paving the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
