Suk-joo Lee

Title: Suk-joo Lee: Innovator in Semiconductor Technology

Introduction

Suk-joo Lee is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His innovative approaches have advanced the methods used in semiconductor device fabrication.

Latest Patents

One of Suk-joo Lee's latest patents is a method of forming fine patterns of semiconductor devices using a double patterning process that employs acid diffusion. This method involves forming multiple first mask patterns on a substrate, followed by the creation of a capping film that includes an acid source. The acid diffuses into a second mask layer, resulting in the formation of acid diffused regions and subsequently, second mask patterns.

Another notable patent focuses on methods, apparatus, and computer program products for fabricating masks and semiconductor devices. This innovation includes identifying design rules for circuit patterns, generating schematic layouts, and performing optical proximity effect correction (OPC) to create effective mask patterns for semiconductor devices.

Career Highlights

Suk-joo Lee is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in enhancing the efficiency and precision of semiconductor manufacturing processes.

Collaborations

Throughout his career, Suk-joo Lee has collaborated with notable colleagues, including Han-Ku Cho and Sang-Gyun Woo. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Suk-joo Lee's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative methods continue to shape the future of semiconductor device fabrication.