The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Sep. 26, 2008
Sung-soo Suh, Gyeonggi-do, KR;
Suk-joo Lee, Gyeonggi-do, KR;
Yong-hee Park, Seoul, KR;
Mi-kyeong Lee, Gyeonggi-do, KR;
Sung-soo Suh, Gyeonggi-do, KR;
Suk-joo Lee, Gyeonggi-do, KR;
Yong-hee Park, Seoul, KR;
Mi-kyeong Lee, Gyeonggi-do, KR;
Abstract
Design rules for circuit patterns of a semiconductor device are identified, and schematic layouts of the circuit patterns are generated according to the design rules. Lithography friendly layout (LFL) circuit patterns are generated from the schematic layouts. Target layout circuit patterns are generated from the LFL circuit patterns. Optical proximity effect correction (OPC) is performed on the target layout circuit patterns to generate OPC circuit patterns. A mask is fabricated from the OPC circuit patterns, and may be used fabricate a semiconductor device.