Suh-Fang Lin

Title: The Innovative Contributions of Suh-Fang Lin

Introduction

Suh-Fang Lin is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of technology, particularly in the development of advanced display devices and semiconductor technologies. With a total of 5 patents to his name, Lin continues to push the boundaries of innovation.

Latest Patents

One of Lin's latest patents is a color conversion panel and display device. This invention includes an opaque substrate and a sapphire substrate, where the opaque substrate features multiple pixel openings filled with quantum dot materials. The sapphire substrate enhances the display's performance with its unique arc surfaces corresponding to the pixel openings. Another notable patent is for an enhancement mode gallium nitride (GaN) based transistor device. This device incorporates a p-type metal oxide layer with extension parts that effectively suppress gate leakage current, showcasing Lin's expertise in semiconductor technology.

Career Highlights

Suh-Fang Lin is affiliated with the Industrial Technology Research Institute, where he has been instrumental in various research and development projects. His work has significantly impacted the advancement of display technologies and semiconductor devices, making him a key figure in his field.

Collaborations

Lin has collaborated with notable colleagues such as Wei-Hung Kuo and Yih-Der Guo. These partnerships have fostered innovation and contributed to the successful development of cutting-edge technologies.

Conclusion

Suh-Fang Lin's contributions to technology through his patents and collaborations highlight his role as an influential inventor. His work continues to inspire advancements in display and semiconductor technologies.